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Publications

  1. Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

    Midathala Yogesh, Mohamad. G. Moinuddin, Manvendra Chauhan, Satinder K. Sharma, Subrata Ghosh, and Kenneth E. Gonsalves
    ACS Appl. Electron. Mater. 2021, https://doi.org/10.1021/acsaelm.0c01120

  2. Resists for Helium Ion Beam Lithography: Recent Advances

    Nagarjuna Ravi Kiran, Manvendra Chauhan, Satinder K. Sharma, Subrata Ghosh and Kenneth E. Gonsalves
    ACS Appl. Electron. Mater. 2020, 2, 12, 3805–3817

  3. Mechanistic Insights of Sn-Based Non-Chemically-Amplified Resists under EUV Irradiation

    Guilherme K. Belmonte, Suelen W. Cendron, Pulikanti Guruprasad Reddy, Cleverson A. S. Moura, Mohamad Ghulam Moinuddin, Jerome Peter, Satinder K. Sharma, Gabriela Lando, Marcelo Puiatti, Kenneth E. Gonsalves and Daniel E. Weibel
    Appl. Surf. Sci, doi.org/10.1016/j.apsusc.2020.146553

  4. Functionalized Ag Nanoparticles Embedded in Polymer Resists for High-Resolution Lithography

    Mohamad G. Moinuddin, Rudra Kumar, Midathala Yogesh, Shivani Sharma, Manoj Sahani, Satinder K. Sharma, and Kenneth E Gonsalves
    ACS Appl. Nano Mater., DOI: 10.1021/acsanm.0c01362

  5. Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

    Rudra Kumar, Manvendra Chauhan, Mohamad G. Moinuddin, Satinder K. Sharma and Kenneth E. Gonsalves
    ACS Appl. Mater. Interfaces, https://doi.org/10.1021/acsami.9b21414

  6. Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography

    Jerome Peter, Mohamad G. Moinuddin, Subrata Ghosh, Satinder K. Sharma and Kenneth E. Gonsalves
    ACS Appl. Polym. Mater., https://doi.org/10.1021/acsapm.0c00005

  7. Polarization Dependence in the Carbon K-edge Photofragmentation of MAPDST Photoresist: an Experimental and Theoretical Study

    C. Moura, G. K. Belmonte, M. Segala, K. E. Gonsalves and D. E. Weibel
    ACS J. Phys. Chem. C, DOI:10.1021/acs.jpcc.8b07288

  8. EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer

    Cleverson Alves da Silva Moura, Guilherme Kretzmann Belmonte, Pulikanti Guruprasad Reddy, Kenneth E. Gonsalves and Daniel Eduardo Weibel
    RSC Adv., 2018, 8, 10930–10938.

  9. EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

    Guilherme Kretzmann Belmonte, Cleverson Alves da Silva Moura, Pulikanti Guruprasad Reddy, Kenneth E. Gonsalves, Daniel Eduardo Weibel
    Journal of Photochemistry & Photobiology A: Chemistry 2018, 364, 373–381.

  10. Organic-Inorganic Hybrid Photoresists Containing Hexafluoroantimonate: Design, Synthesis and High Resolution EUV Lithography Studies

    P. Guru Prasad Reddy, Pawan Kumar, Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K Sharma and Kenneth E Gonsalves
    Mater. Chem. Front., 2017, (DOI: 10.1039/C7QM00343A )

  11. New non - chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning

    Neha Thakur, Pulikanti Guruprasad Reddy, SANTU NANDI, Midathala Yogesh, Satinder Kumar Sharma, Chullikkattil P Pradeep, Subrata Ghosh and Kenneth E Gonsalves
    J. Micromech. Microeng., 2017, (DOI: https://doi.org/10.1088/1361-6439/aa8751 )

  12. Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

    Pulikanti Guruprasad Reddy, Neha Thakur, Chien-Lin Lee, Sheng-Wei Chien, Chullikkattil P. Pradeep, Subrata Ghosh, Kuen-Yu Tsai, and Kenneth E. Gonsalves
    AIP Adv., 2017, 7, 085314.

  13. A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

    Santu Nandi, Midathala Yogesh, Pulikanti Guruprasad Reddy, Satinder K. Sharma, Chullikkattil P. Pradeep, Subrata Ghosh and Kenneth E. Gonsalves
    Mater. Chem. Front., 2017, (DOI: 10.1039/C7QM00140A )

  14. Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

    Pulikanti Guruprasad Reddy, Satyendra Prakash Pal, Pawan Kumar, Chullikkattil P. Pradeep , Subrata Ghosh, Satinder K. Sharma, and Kenneth E. Gonsalves
    ACS Appl. Mater. Interfaces, 2017, 9, 17 - 21.

  15. Recent advances in non-chemically amplified photoresists for next generation IC technology

    Subrata Ghosh, Chullikkattil P. Pradeep*, Satinder K. Sharma, Pulikanti Guruprasad Reddy, Satyendra P. Pal and Kenneth E. Gonsalves
    RSC Adv., 2016, 6, 74462 - 74481.

  16. Design, development, EUVL applications and nanomechanical properties of a new HfO2 based hybrid non-chemically amplified resist.

    Pulikanti Guruprasad Reddy, Narsimha Mamidi, Pawan Kumar, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, and Chullikkattil P. Pradeep
    RSC Adv., 2016, 6, 67143.

  17. Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography

    Satinder K. Sharma , Satyendra Prakash Pal, Pulikanti Guruprasad Reddy, Pawan Kumar, Subrata Ghosh, and Kenneth E. Gonsalves
    Microelectron. Eng. 2016, 164, 115 - 122.

  18. Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of nonchemically amplified photoresist

    Subrata Ghosh, V. S. V. Satyanarayana, Bulti Pramanick, Satinder K. Sharma, Chullikkattil P. Pradeep, Israel Morales-Reyes, Nikola Batina, Kenneth E. Gonsalves
    Sci. Rep., 2016, 6, 22664.

  19. A radiation sensitive hybrid polymer based on an Mn-Anderson polyoxometalate cluster and a UV active organic monomer: synergistic effects lead to improved photocurrent in a photoresponse device

    Vishwanath Kalyani, V. S. V. Satyanarayana, Abdus Salam Sarkar, Ashwani Kumar, Suman K. Pal, Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep
    RSC Adv. 2015, 5, 36727 - 36731.

  20. New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano - Patterning

    Vishwanath kalyani, V. S. V. Satyanarayana, Vikram Singh, Chullikkattil P. Pradeep, Subrata Ghosh, Satinder K Sharma, Kenneth E Gonsalves
    Chem. Eur J. 2015, 21, 2250 - 2258.

  21. Selective Fragmentation of Radiation-Sensitive Novel Polymeric Resist Materials by Inner-Shell Irradiation

    Gabriela Ramos Chagas, Vardhineedi Sri Venkata Satyanarayana, Felipe Kessler, Guilherme Kretzmann Belmonte, Kenneth E. Gonsalves, and Daniel Eduardo Weibel,
    ACS Appl. Mater. Interfaces 2015, 7, 16348−16356.

  22. Hybrid polymeric material bearing ferrocene based pendant organometallic functionality: synthesis and applications in nano-patterning using EUV lithography

    V. S. V. Satyanarayana, Vikram Singh, Vishwanath kalyani, Chullikkattil P. Pradeep, Satinder K Sharma, Subrata Ghosh, Kenneth E Gonsalves
    RSC Adv. 2014, 4, 59817 - 59820.

  23. Radiation Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies

    V S V Satyanarayana, Felipe Kessler, Vikram Singh, Francine R Scheffer, Daniel E Weibel, Subrata Ghosh, Kenneth E Gonsalves
    ACS Appl. Mater. Interfaces 2014, 6, 4223 - 4232.

  24. Towards novel non - chemically amplified (n-CARS) negative resists for electron beam lithography applications

    Vikram Singh, V.S.V. Satayanarayana, Satinder Sharma, Subrata Ghosh, K. E. Gonsalves
    J. Mater. Chem. C 2014, 2, 2118 - 2122.

  25. Performance evaluation of nonchemically amplified negative tone photoresists for e - beam and EUV lithography

    Vikram Singh, Vardhineedi Sri Venkata Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder K. Sharma, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Subrata Ghosh, Kenneth E. Gonsalves
    J. Micro/ Nanolith. MEMS, and MOEMS 2014, 13, 043002.