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Patents

  1. Photoacid generators and lithographic resists comprising the same

    Kenneth E. Gonsalves and Mingxing Wang.
    04.06.2019, USA Patent 10310375

  2. A new class of Non-Chemically Amplified Molecular Photoresists For Next Generation Integrated Circuits (ICs) Technology

    Kenneth E. Gonsalves, Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, Neha Thakur, P. Guruprasad Reddy, Santu Nandi, Midathala Yogesh.
    Filed, 24.12.2016, (Application No. 201611044190)

  3. Resist Technology Based on Polyarylene sulphide: (PAS) as a Unique Polymer Material for Semiconductor Fabrication Technology

    Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal
    Filed, 2016, (Application No. 201611018061)

  4. Highly Sensitive MAPDSM-MAPDST Based Resists Technology For Next Generation Lithography Applications

    Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar
    Filed, 2016, (Application No. 201611022219)

  5. Photoacid Generators and Lithographic Resists Comprising the Same

    Kenneth E. Gonsalves et al, US 2011/0159431 A1

  6. Photoacid Generators and Lithographic Resists Comprising the Same

    Kenneth E. Gonsalves et al, US 7,833,690 B2

  7. High Resolution Resists for Next Generation Lithographies

    Kenneth E. Gonsalves , US 7,776,505 B2

  8. High Resolution Resists for Next Generation Lithographies

    Kenneth E. Gonsalves , US 7,008,749 B2

  9. Nanocomposite Negative Resists for Next Generation Lithographies

    Kenneth E. Gonsalves et al, US 7,049,044 B2