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Conference Proceedings

  1. Molecular weight distribution effects and optimization in terpolymer DUV Photoresists

    Midathala Yogesh, Santu Nandi, Satinder K. Sharma, Chullikkattil P. Pradeep, Subrata Ghosh and Kenneth E. Gonsalves
    Presented in poster (MRSI 2018)

  2. Cresol Novolak Photoresists: Effect of Compositions, Fractionation and Oligomer concentration on Patterning Potential for Thick Film

    J S Borah, P K Yadav, S. Nandi, R. Yadav, A. De, S. Jangra, S. K. Sharma, Chullikkattil P.Pradeep, S. Ghosh and Kenneth E. Gonsalves
    Presented in poster (MRSI 2018); doi: https://dx.doi.org/10.5281/zenodo.1171971

  3. Electron Beam Lithography of sensitive resist based on photoacid generator integrated terpolymer: potentiality of high-resolution pattern transfer

    Santu Nandi, Midathala Yogesh, Pulikanti Guruprasad Reddy, Satinder K. Sharma, Chullikkattil P.Pradeep, Subrata Ghosh and Kenneth E. Gonsalves
    Presented in poster (MRSI 2018)

  4. Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications

    Satinder K. Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil P. Pradeep, Kenneth E. Gonsalves
    Proc. SPIE 10584, Emerging Patterning Technologies 2018, 1058409 (19 March 2018); doi: 10.1117/12.2297537

  5. Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node

    Satinder K. Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil P. Pradeep, Subrata Ghosh, Kenneth E. Gonsalves
    Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831Q (19 March 2018); doi: 10.1117/12.2297565

  6. Novel non-chemically amplified (n-CARs) negative resists for EUVL

    Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
    Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905106 (March 27,2014); doi:10.1117/12.2041183

  7. Design and synthesis of novel resist materials for EUVL

    V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves
    Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481W (April 17, 2014);doi:10.1117/12.2045736

  8. Optimization of processing parameters and metrology for novel NCA negative resists for NGL

    Vikram Singh, V. S. V. Satyanarayana, Fillip Kessler, F. R. Scheffer, Daniel E. Weibel, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves
    Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481Y (April 17, 2014);doi:10.1117/12.2045882

  9. Organic-inorganic hybrid resists for EUVL

    Vikram Singh, Viswanath Kalyani, V. S. V. Satyanarayana, C. P. Pradeep, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves
    Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511W (March 27, 2014); doi:10.1117/12.2041907